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1
Microlithography · Molecular Imprinting: -/-
Springer-Verlag Berlin Heidelberg
Jean Daniel Marty
,
Monique Mauzac (auth.)
resist
polymer
resists
chemical
sci
polymers
proc
amplification
technol
spie
poly
dissolution
lithography
imaging
photopolym
aqueous
polymerization
positive
molecular
microlithography
materials
negative
copolymer
systems
tert
deprotection
phost
catalyzed
groups
silylation
polym
methacrylate
bilayer
radical
willson
tboc
layer
phenolic
thermal
crosslinking
novolac
contrast
template
copolymers
mosbach
solution
developer
monomer
butyl
containing
Anno:
2005
Lingua:
english
File:
PDF, 4.34 MB
I tuoi tag:
0
/
0
english, 2005
2
Microlithography · Molecular Imprinting: -/-
Springer-Verlag Berlin Heidelberg
Jean Daniel Marty
,
Monique Mauzac (auth.)
resist
polymer
resists
chemical
sci
polymers
proc
amplification
technol
spie
poly
dissolution
lithography
imaging
photopolym
aqueous
polymerization
positive
molecular
microlithography
materials
negative
copolymer
systems
tert
deprotection
phost
catalyzed
groups
silylation
polym
methacrylate
bilayer
radical
willson
tboc
layer
phenolic
thermal
crosslinking
novolac
contrast
template
copolymers
mosbach
solution
developer
monomer
butyl
containing
Anno:
2005
Lingua:
english
File:
PDF, 4.34 MB
I tuoi tag:
0
/
0
english, 2005
3
Photopolymers: Photoresist Materials, Processes, and Applications
CRC Press/Taylor and Francis Group
Kenichiro Nakamura
,
(Chemical engineer)
ch3
ch2
figure
shown
resist
photopolymers
materials
polymer
polymerization
processes
photoresist
lithography
sci
radical
technol
photopolymerization
resists
h3c
photopolym
hardening
reaction
reported
nanoimprint
poly
h2c
methacrylate
irradiation
coating
layer
polymers
optical
shows
pmma
etching
resin
technology
wafer
amplified
ink
euv
thermal
chemically
immersion
methyl
absorption
chemical
oxygen
spie
effective
proc
Anno:
2014
Lingua:
english
File:
PDF, 9.34 MB
I tuoi tag:
0
/
0
english, 2014
4
doi:10.1016/j.progpolymsci.2008.10.002
Unknown
surface
polymer
polym
sci
polymerization
photografting
poly
grafting
mmt
nanocomposites
intercalated
graft
groups
appl
polymers
grafted
modification
film
membranes
progress
films
biodegradable
irradiation
pcl
materials
surfaces
substrate
thermal
intercalation
prepared
monomers
tallow
technol
content
temperature
silicate
systems
solvent
layered
exfoliated
photobase
c18
nano
photo
substrates
method
shirai
layers
mechanical
melt
Anno:
2009
Lingua:
english
File:
PDF, 8.93 MB
I tuoi tag:
0
/
0
english, 2009
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